About Discheminc
HSQ Resist
HSQ resist is a high-resolution negative-tone resist widely used in electron beam lithography. With its ability to create sub-10 nm features, HSQ is crucial for […]
46 total views, 1 today
Hydrogen Silsesquioxane EBL Resist
Hydrogen Silsesquioxane (HSQ) serves as a negative electron-beam lithography resist, allowing ultra-precise patterning at the nanoscale level. Known for its high contrast and etch resistance, […]
44 total views, 0 today