- Member Since: April 18, 2025
If your microstructures are suffering from peeling or undercutting during wet processing, our Photoresist adhesion promoter is here to help. At DisChem, we pride ourselves […]
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Unlock the full potential of your nanolithography process with our high-purity hydrogen silsesquioxane ebl resist. At DisChem, we offer this advanced silicon-based material to help […]
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